News
Company Press Releases
2009
08-05-2009
Luminescent Broadens Portfolio by Adding Computational Photomask Inspection Solution
07-23-2009
Luminescent Advances Computational Lithography Lead
02-09-2009
2008
02-20-2008
2007
Luminescent Wins Order from Premier U.S. Semiconductor Manufacturer
09-17-2007
Luminescent secures $9 million in new financing round, Moris Kori moves into CEO role
06-13-2007
Luminescent 2nd Patent Press Release
04-12-2007
02-27-2007
2006
12-05-2006
Luminescent Names Well-Known Lithography Expert as Managing Director of Engineering
12-04-2006
Luminescent Names Dan Maydan and Joel Monnier to its Board of Advisors
07-10-2006
Luminescent Names Moris Kori As Executive Vice President
02-13-2006
2005
SMIC Enters into Joint Development Effort with Luminescent for Its 65nm and Below Process Nodes
10-05-2005
10-03-2005
Luminescent to provide enabling lithography platform to Cypress's Silicon Valley Technology Center
10-03-2005
Luminescent In the News
2009
Luminescent offers Offline Computational Mask Inspection
- Fabtech07-30-2009
Luminescent rolls Photomask Inspection Software
- EETimes07-23-2009
What is Source Mask Optimization?
- EETimes 02-27-2009
Luminescent claims growing customer base for its ‘Inverse' litho technology
- FABTECH02-12-2009
2008
EE Times updates list of emerging startups
- EETimes02-01-2008
2007
- Semiconductor International09-20-2007
Inverse Lithography Gains Further Market Acceptance
- Semiconductor International09-17-2007
EE Times updates list of emerging startups
- EETimes09-04-2007
Intel tips inverse litho amid EUV delays
- EETimes06-21-2007
Luminescent adds $9M financing, swaps CEO
- SolidState Technology06-14-2007
Luminescent raises funds, names CEO
- EETimes 06-14-2007
Luminescent secures $9M in funding, names new CEO
- EDN06-14-2007
Inverse Lithography Makes New Inroads in RET
- Semiconductor International05-01-2007
Second U.S. patent issued to Luminescent for inverse litho technology
- Semiconductor FABTECH04-12-2007
Luminescent scores second patent for inverse litho technology
- EDN04-12-2007
Luminescent Boosts 45, 32 nm RET With Inverse Litho Technology
- Lithography Report03-14-2007
Modeling becomes key to advanced lithography
- Wafer News03-08-2007
ILT promises many benefits over old technology
- Electronicstalk03-06-2007
Is better OPC an alternative to immersion lilthography?
- EDN 03-01-2007
Luminescent has inverse litho technology booster
- Electronics Weekly02-28-2007
Luminescent boosts 45-nm, -32nm RET with inverse litho technology
- EDN02-27-2007
Luminescent boosts 45-nm, -32nm RET with inverse litho technology
- Semiconductor International02-27-2007
Luminescent touts 45-32nm benefits of "ILT"
- Solid State Technology02-27-2007
Startup: OPC alternative may extend dry steppers
- EE Times02-27-2007
Startup Luminescent shines new light on OPC
- EE Times01-22-2007
2006
RET giving OPC a run-cycle for its money
- IBM: Power Architecture Zone Editors' Notebook.12-08-2006
Luminizer lights path to replace OPC
- EE Times12-07-2006
A process window-based approach to mask optimization
- Solid State Technology10-01-2006
EE Times updates list of emerging startups
- EE Times04-27-2006
2005
New Enhancement Platform Starts at the Wafer
- Semiconductor International11-01-2005
Luminescent uncloaks with new OPC technology
- Wafer News/Microlithography World10-05-2005
Luminescent gains litho win with SMIC
- EETimes10-05-2005
SMIC, Luminescent Explore 65nm Litho
- Electronic News10-05-2005
Startup upends reticle enhancement
- EETimes 10-03-2005
Start Up Runs End Around Mask Correction Tech
- Electronic News10-03-2005
Sevin startup Luminescent shines
- SiliconValleyWatcher09-29-2005
EE Times updates list of 60 emerging startups
- EEtimes04-29-2005
Why Choose Us
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