COMPANY OVERVIEW

Company

Luminescent Technologies supplies products to the semiconductor industry to enable precise on-wafer pattern fidelity, large process windows and short time to silicon for accelerated yield ramps, superior design tolerance and favorable IC economics. The Company’s computational lithography and defect management solutions, based upon breakthrough Inverse Lithography Technology (ILT) uses sophisticated mathematical methods and innovative software algorithms to rigorously solve for the optimal semiconductor lithography and inspection processes.

Luminescent Technologies is a privately held, venture-backed company headquartered in Palo Alto, CA.

Intersecting Challenges: Computational Lithography and Computational Defect Management

As the semiconductor industry is moving to very low k₁ patterning solutions, the problems facing lithography engineers are becoming much more complex. Choosing the right computational lithography technique for mask synthesis is essential for bridging the wavelength gap, to enhance lithography resolution, to get to high volume manufacturing on schedule, and to achieve the required manufacturing process window for random as well as periodic layout patterns. Inverse Lithography Technology (ILT) using the level set method (LSM) is numerically the most efficient, stable and flexible approach to advanced mask synthesis. Luminescent’s Inverse Synthesizer™ offers the industry’s only ILT solution that uses LSM and is ready for full chip ILT mask synthesis in production, meeting all required manufacturing constraints while achieving pattern fidelity with process latitude that cannot be obtained by common model based OPC methods. As a result, designs with denser patterns and less restrictive design rules can be implemented in high volume production.

Mask defect management is a challenge that intersects advanced mask synthesis. Wafer defects cease to correlate with mask defects, necessitating sophisticated computational methods to bridge the gap. Luminescent has developed a suite of computational defect management solutions that complement advanced inspection, metrology and repair equipment, enabling them to operate at higher capabilities and efficiencies, meeting the requirements of computational lithography masks.

It is time to switch your process to ILT using Luminescent's proven computational lithography and defect management solutions.

For more information, please contact us.