Inverse Explorer™
Computes an optimum mask for each input target, by systematically varying the design target, and determines design rules by exploring the limits of the lithography solution space.
Inverse Synthesizer™
Industry’s only ILT solution for full chip ILT mask synthesis that uses LSM, and achieves pattern fidelity and process windows that cannot be obtained by common model based OPC methods.
LAIPH™
A suite of computational defect management solutions complement expensive inspection, metrology and repair equipment, enabling them to operate at higher capability and efficiency, meeting the requirements of ILT masks.
FEATURED
With device geometries shrinking to sizes well below the wavelength used to image them (e.g., 22nm geometry being imaged with 193nm wavelength), model-based evaluation is iterative and extremely computing resource intensive. Rule tables tend grow exponentially with each subsequent generation.